Comparison ledger
Pfeiffer ACP040G, Pfeiffer ACP28G, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | ACP040GPfeiffer | ACP28GPfeiffer |
|---|---|---|
| OEM | Pfeiffer | Pfeiffer |
| Category | Deposition | Deposition |
| Wafer size | 100mm | 100mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Pfeiffer ACP040G | Pfeiffer ACP28G |
| Specifications | ||
| Role | Chamber primary pump[1] | Loadlock primary pump[1] |
| Pump type | Dry pump[1] | Dry pump[1] |
| Associated system | EVA 451 thermal evaporator[1] | — |
| Manufacturer | — | Pfeiffer[1] |
| Contextual system | — | EVA 451 evaporator[1] |
| Intended application | — | Pumping traces of corrosive gas[2] |
| Pumping mechanism | — | Frictionless multi-stage roots design[2] |
| Voltage range | — | 90 to 254 VAC at 50 or 60 Hz[2] |
| Overhaul interval | — | 22,000 hours[2] |
Plan your fab
Building a Deposition process? Get a complete equipment list.
Open the fab equipment planner →