Waferpedia

Comparison ledger

WD 620 Cversus1000P

SCREEN WD 620 C, YES 1000P, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
WD 620 CSCREEN
OEMSCREENYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer sizefor Si and SiC base wafer—
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones—1998 Acquisition
Control system——
Generation——
FamilySCREEN WD 620 CYES 1000P
Specifications
Wafer sizefor Si and SiC base wafer[1]—
Model—1000P[2]
System type—Plasma cleaning system[2]
Shelf configuration—Four 16 x 16 inch shelves[2]
Total capacity—1024 square inches[2]
Control system—PLC driven with plain English real time process readout and diagnostics in the event of system abort[2]
Number of shelves—4[2]
Shelf size—16 x 16 inches[2]
Power—1000 W[3]
Configuration—Parallel plate[3]
Operation modes—Active, RIE, Downstream[2]
Sample size range—From smallest semiconductor chip to large flat panels[2]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]web.archive.orgweb.archive.org
  3. [3]semistarcorp.comsemistarcorp.com