Waferpedia

Comparison ledger

WS 620 Cversus1000FP

SCREEN WS 620 C, YES 1000FP, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
WS 620 CSCREEN
OEMSCREENYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySCREEN WS 620 CYES 1000FP
Specifications
ConfigurationConvertible to 8"[1]—
ManufacturerSCREEN / DNS[1]—
ModelWS 620 C[1]Glen/YES 1000FP[3]
Tool typeWet Bench[1]—
CategoryWet Processing / Clean[2]—
Wafer sizes6 inch[1]—
Convertible to8 inch[1]—
Tank configurationCaro (SPM), H/C QDR, dHF, EDR, hotPhos, H/C QDR, SC1, QDR, SC2, H/C QDR, FR, IPA Vapor Dryer[1]—
System type—Plasma cleaning system[3]
Line—R-Series Plasma Cleaning Systems (Glen Technologies)[3]
Designed use—Designed to accept a range of shelf sizes[3]
Application focus—Changing needs of the flat panel industry[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]web.archive.orgweb.archive.org