Waferpedia

Comparison ledger

11600 SRDversusG1000

Semitool 11600 SRD, YES G1000, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
11600 SRDSemitool
OEMSemitoolYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySemitool 11600 SRDYES G1000
Specifications
ConfigurationCeramic[1]—
ManufacturerSemitool[1]—
Model11600 SRD[1]—
Equipment typeSpin Rinse Dryer[1]—
Plasma frequency—40 kHz[2]
Powered shelves—4 powered shelves[2]
Plasma modes—5 plasma modes: Electron free / Downstream mode, Active mode, RIE mode, Active Ion trap, Downstream Ion trap[2]
Chamber—1/2" 6061-T6 aluminum chamber[2]
Process area per tray—15.13" W x 15.39" D[2]
Matching—Variable Frequency Matching (VFM)[2]
Interface—Touch Screen Interface[2]
Design—Unique downstream protective design; totally charge-free plasma[2]
Control—State logic control of output with input monitoring[2]
Number of powered shelves—4[2]
Chamber material—1/2" 6061-T6 aluminum[2]
Variable Frequency Matching (VFM)—Present[2]
Touch screen interface—Present[2]
Downstream protective design—Totally charge-free plasma[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]pnf.uchicago.edupnf.uchicago.edu