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Comparison ledger

150 e MaskversusAct 8 I-Line Track

SUSS MicroTec 150 e Mask, Tokyo Electron Act 8 I-Line Track, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
150 e MaskSUSS MicroTec
Act 8 I-Line TrackTokyo Electron
OEMSUSS MicroTecTokyo Electron
CategoryLithographyLithography
Wafer size——
Process node——
Introduced—1999
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation—i-line
FamilySUSS MicroTec 150 e MaskTokyo Electron Act
Cited variants—
  • Act 8 I-Line Track, 8" 1C/3DI-Line[1]
  • Act 8 I-Line Track, 8" 2C/2DI-Line[2]
  • Tel Act 8 I-Line Track, 8" 1C/3D 1999 Vintagei-line[1]
  • Tel Act 8 I-Line Track, 8" 1C/3D 2000 Vintagei-line[3]
  • Tel Act 8 I-Line Track, 8" 2C/2D 2000 Vintagei-line[4]
  • Tel Act 8 I-Line Track, 8" 2C/2D 2001 Vintagei-line[2]
  • Act 8 1C/3D (1999)I-line[1]
  • Act 8 1C/3D (2000)I-line[5]
  • Act 8 2C/2D (2000)I-line[4]
  • Act 8 2C/2D (2001)I-line[2]
Specifications
Configuration—1C/3D[1]
Make—Tel[1]
Model—Act 8[1]
Wafer Size—8 inch[1]
Vintage—1999[1]
Generation—I-Line[1]
150 e Mask entryAct 8 I-Line Track entryAsk about these tools →Share experience with this comparison →

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Sources (5)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing
  3. [3]Equipment inventory listing
  4. [4]Equipment inventory listing
  5. [5]Equipment inventory listing