Waferpedia

Comparison ledger

ACS 300 Gen 2versus58TA

SUSS MicroTec ACS 300 Gen 2, YES 58TA, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
ACS 300 Gen 2SUSS MicroTec
58TAYES
OEMSUSS MicroTecYES
CategoryThermal / DiffusionThermal / Diffusion
Wafer size300mm300mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySUSS MicroTec ACS 300YES 58TA
Specifications
ConfigurationIncludes:[1]—
Wafer sizeSystem tooling for 200/300 mm semi spec wafer sizes[1]—
OEMSUSS MicroTec[2]—
ModelACS 300 Gen 2[3]—
Equipment typeCoater / Developer[1]—
Automationfully automatic[2]—
Architecturemodular[2]—
Process modesspin-coating and spray-coating[2]—
Integrated functionscoat, bake, and develop modules[1]—
Operation temperature—ambient to 180 °C[4]
Image reversal bake throughput—1 load/hour[4]
Vacuum bake/vapor prime throughput—2 loads/hour[4]
Wafer handling—handles wafers up to 300 mm[4]
Process control—fully programmable process time and temperature[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]web.archive.orgweb.archive.org
  3. [3]Equipment inventory listing
  4. [4]pnf.uchicago.edupnf.uchicago.edu