Comparison ledger
SUSS MicroTec MA 6 BA 6 Mask, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | MA 6 BA 6 MaskSUSS MicroTec | 1000 FamilyUltratech |
|---|---|---|
| OEM | SUSS MicroTec | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | Wafer chuck (1) | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SUSS MicroTec MA 6 Mask | Ultratech 1000 Family |
| Cited variants | — | |
| Specifications | ||
| Configuration | 200-240 V[3] | — |
| Full Load | 10 A[3] | — |
| Protection | 16 A[3] | — |
| Objectives | 5x ,10x , 20x[4] | — |
| Power | 350 W lamphouse[4] | — |
| Wafer size | Wafer chuck (1)[4] | — |
| System power | 230 V, 50/60 Hz[4] | — |
| Voltage | 230 V[2] | — |
| Make | SUSS[3] | — |
| Model | MA 6 / BA 6[3] | — |
| Alignment | TSA (Top-Side Alignment), BSA (Back-Side Alignment)[1] | — |
| Wafer sizes | 2, 3, 4, 5, 6 inch[4] | — |
| Supports | 365 nm and 405 nm exposure wavelengths[4] | — |
| Lamphouse | 350 W[4] | — |
| Load | Single Load[3] | — |
| Top-Side Alignment (TSA) | Supported[4] | — |
| Back-Side Alignment (BSA) | Supported[4] | — |
| Microscope | Suss DVM6 Microscope[4] | — |
| Optics | UV400 optics (supports 365 nm and 405 nm exposure wavelengths)[4] | — |
| Power supply | Gen2 CIC power supply[4] | — |
| Contact modes | Soft, Hard, Vacuum[4] | — |
| Wafer chuck | 1[4] | — |
| Mask holder | 1[4] | — |
| Vibration-isolation table | Included (for MA6)[4] | — |
| HDD and software | Included[4] | — |
| Voltage range | 200-240 V[3] | — |
| Full load current | 10 A[3] | — |
| Protection current | 16 A[3] | — |
| Power rating (VA) | 1500 VA[2] | — |
| Optical BSA | Supported[2] | — |
| Tool type | — | Photolithography step-and-repeat 1X stepper[5] |
| Optical design | — | Wynne Dyson[5] |
| Magnification | — | 1X[5] |
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