SUSS MicroTec
MA 6 Mask alternatives
Comparable Lithography equipment documented in the Waferpedia catalog.
6 comparable tools
OAI
200
Lithography
The OAI Model 200 is a tabletop mask aligner and UV exposure system designed for R&D and low-volume production.
OAI
806 Mask
Lithography
The OAI 806 Mask Aligner is a manual wafer load mask aligner used for photolithography, supporting wafer sizes up to 6 inches with submicron alignment accuracy.
Canon
FPA 3000 i 5 + Fine Pattern
Lithography
Canon FPA 3000 i 5 + Fine Pattern is a lithography aligner described with a 6-inch wafer size.
Brooks
017-0024-01 Prealigner
Lithography
Brooks
017-0146-01 Prealigner
Lithography
Brooks 017-0146-01 is a prealigner manufactured by Brooks.
Ultratech
1000 Family
Lithography
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