Comparison ledger
TEGAL 211, Tokyo Electron Act 8, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 211TEGAL | Act 8Tokyo Electron |
|---|---|---|
| OEM | TEGAL | Tokyo Electron |
| Category | Resist Processing | Resist Processing |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | TEGAL 211 | Tokyo Electron Act |
| Cited variants | — |
|
| Specifications | ||
| Refurbished RTP RTA | AG Associates 4100, 4108, 8108, 8800, 8800i,210, 310, 410, 610, 610I, MPT RTP-600S, 800S, RTP-3000[4] | — |
| KLA-Tencor Spare Parts and Service | RS-35C,RS-55,RS-75,RS-100,UV-1050,UV-1080,UV-1250,UV-1280,ASET F5 / F5X,AIT Systems,HRP-220 Stylus Profiler[4] | — |
| Refurbished Isotropic Plasma Etcher | Matrix, Tegal, Lam Research, Branson/IPC, PlasmaTherm[4] | — |
| Refurbished PECVD, ALD Equipment | Cambridge, Oxford PlasmaLab , Plasma-Therm, STS/SPTS, AMAT[4] | — |
| Refurbished Mask Aligner | Canon Neutronix PLA501/545, Suss MA200CC, MA8BA8 GEN3, MA8BA8 GEN2, MA8BA8, MA200E[4] | — |
| Refurbished Bonding | SUSS SB6E, SUSS SB8E, EVG 620 BA, EVG EV501, West Bond 7200AR 7400A[4] | — |
| Refurbished Wafer Prober | Electroglas EG 4090u+, EG 4090, EG 2001X, EG 1034X, Cascade PS-21[4] | — |
| Process Type | Plasma Asher/Etcher[5] | — |
| Wafer Size (max) | 3 inch[5] | — |
| Form Factor | Table top[5] | — |
| Chamber Material | Aluminum[4] | — |
| Chamber Internal Dimensions | 6 x 6 x 3.75 inches[4] | — |
| Timer Range | 0-99 minutes[5] | — |
| Configuration | — | Dual Block, 4 Load Port/1 Side Port[1] |
| Vintage | — | 2006 |
| Coaters & Developers Vintage | — | 1999 |
| Wafer Size | — | 8 inch[8] |
Plan your fab
Building a Resist Processing process? Get a complete equipment list.
Open the fab equipment planner →