Comparison ledger
Tokyo Electron Clean Track Mark 8, YES 1000P, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Clean Track Mark 8Tokyo Electron | 1000PYES |
|---|---|---|
| OEM | Tokyo Electron | YES |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 1998 Acquisition |
| Control system | — | — |
| Generation | — | — |
| Family | Tokyo Electron Clean Track | YES 1000P |
| Specifications | ||
| Configuration | 2C (1 ARC) / 2D (4 Cup Frame), 1 WEE[1] | Parallel plate[4] |
| WEE | Tel Standard[1] | — |
| PR Pump | 2-1 (3), 2-2[1] | — |
| Pump Type | 2-1; RRC, 2-2; RRC[1] | — |
| Type | Coater / Developer[1] | — |
| Wafer sizes supported | 8 inch[1] | — |
| Coat process - PR pump | 2-1 (3), 2-2[1] | — |
| Developer - Nozzle | 2-3; H Nozzle[1] | — |
| Resist processing (from journal) | Used for resist coating and development[2] | — |
| Wafer size | 8 inch[1] | — |
| Capability | Photoresist coating and developing, including HMDS treatment[2] | — |
| Vintage | 1998[1] | — |
| Model | — | 1000P[3] |
| System type | — | Plasma cleaning system[3] |
| Shelf configuration | — | Four 16 x 16 inch shelves[3] |
| Total capacity | — | 1024 square inches[3] |
| Control system | — | PLC driven with plain English real time process readout and diagnostics in the event of system abort[3] |
| Number of shelves | — | 4[3] |
| Shelf size | — | 16 x 16 inches[3] |
| Power | — | 1000 W[4] |
| Operation modes | — | Active, RIE, Downstream[3] |
| Sample size range | — | From smallest semiconductor chip to large flat panels[3] |
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