Waferpedia

Comparison ledger

1000PversusG1000

YES 1000P, YES G1000, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMYESYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones1998 Acquisition—
Control system——
Generation——
FamilyYES 1000PYES G1000
Specifications
Model1000P[1]—
System typePlasma cleaning system[1]—
Shelf configurationFour 16 x 16 inch shelves[1]—
Total capacity1024 square inches[1]—
Control systemPLC driven with plain English real time process readout and diagnostics in the event of system abort[1]—
Number of shelves4[1]—
Shelf size16 x 16 inches[1]—
Power1000 W[2]—
ConfigurationParallel plate[2]—
Operation modesActive, RIE, Downstream[1]—
Sample size rangeFrom smallest semiconductor chip to large flat panels[1]—
Plasma frequency—40 kHz[3]
Powered shelves—4 powered shelves[3]
Plasma modes—5 plasma modes: Electron free / Downstream mode, Active mode, RIE mode, Active Ion trap, Downstream Ion trap[3]
Chamber—1/2" 6061-T6 aluminum chamber[3]
Process area per tray—15.13" W x 15.39" D[3]
Matching—Variable Frequency Matching (VFM)[3]
Interface—Touch Screen Interface[3]
Design—Unique downstream protective design; totally charge-free plasma[3]
Control—State logic control of output with input monitoring[3]
Number of powered shelves—4[3]
Chamber material—1/2" 6061-T6 aluminum[3]
Variable Frequency Matching (VFM)—Present[3]
Touch screen interface—Present[3]
Downstream protective design—Totally charge-free plasma[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]pnf.uchicago.edupnf.uchicago.edu