Waferpedia

Comparison ledger

0010-03254 E ChuckversusOP 2600

Applied Materials 0010-03254 E Chuck, KLA OP 2600, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03254 E ChuckApplied Materials
OEMApplied MaterialsKLA
Category—Metrology & Inspection
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones—1994 Vintage
Control system——
Generation——
Family—KLA OP 2600
Specifications
P/N—5A-80-00-0007-10[1]
Configuration—Refurbished[1]
Make—KLA / Therma-wave[1]
Model—OP 2600[1]
Tool name—Thermawave OP2600[2]
Wafer size—8 inch[2]
Vintage—1994-12[2]
Tool condition—Refurbished[2]
Description—Thin film measurement[3]
Cassette loader stations—Two[2]
Optical source—675 nm thermoelectrically cooled diode laser[2]
Spectrometry light source—450 to 840 nm tungsten halogen lamp[2]
Measurement modes—Beam Profile Reflectometry (BPR), Beam Profile Ellipsometry (BPE), and spectrometry[2]
Manufacturer—KLA / Therma-wave[1]
Wafer compatibility—4 to 8 inches[2]
Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]jenesisequipment.comjenesisequipment.com
  3. [3]semiday.comsemiday.com