Comparison ledger
Applied Materials 0010-03254 E Chuck, Ulvac SOPHI 200, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03254 E ChuckApplied Materials | SOPHI 200Ulvac |
|---|---|---|
| OEM | Applied Materials | Ulvac |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | — | Ulvac SOPHI 200 |
| Specifications | ||
| Category | — | Ion Implantation[1] |
| Beam current | — | ~500 μA[1] |
| Throughput | — | more than 100 pieces/h (6in)[1] |
| Dose range | — | actual dose 10^10~10^14 ions/cm2[1] |