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Comparison ledger

0010-03485 Magnet AssyversusUVision 200

Applied Materials 0010-03485 Magnet Assy, Applied Materials UVision 200, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
UVision 200Applied Materials
OEMApplied MaterialsApplied Materials
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyApplied Materials UVision 200
Specifications
ConfigurationWP AL 300mm PVD[1]—
OEMApplied Materials[1]—
Model0010-03485[1]UVision 200[5]
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]—
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Make—Applied Materials[5]
Wafer Sizes—12 inch[5]
Type—brightfield inspection system[6]
Frequency—60 Hz[6]
Wafer handling—300/200mm end effector[6]
Configuration option—Isoport[6]
Startup specification—Standard start up spec[6]
Option—OHT P I/O sensor for E84 (Hokuyo) L=5m[6]
Sources (6)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]Equipment inventory listing
  6. [6]waferpedia.comwaferpedia.com