Waferpedia

Comparison ledger

0010-03485 Magnet Assyversus100 Spinner

Applied Materials 0010-03485 Magnet Assy, CEE 100 Spinner, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
OEMApplied MaterialsCEE
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyCEE 100 Spinner
Specifications
ConfigurationWP AL 300mm PVD[1]—
OEMApplied Materials[1]—
Model0010-03485[1]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]—
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Spin Speed Range—1 to 6000 RPM[5]
Acceleration Range—1 to 30000 RPM/s[5]
Step Time Range—1 to 999 seconds[5]
Programmable Presets—10[6]
Steps per Program—Up to 10 steps[6]
Wafer Size—Up to 6 inches (152.4 mm)[6]
Available Spin Chucks—2.25 inches (57.2 mm) and 0.3125 inches (7.9 mm)[5]
Sources (6)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]nanofab.ku.edunanofab.ku.edu
  6. [6]nanofab.utah.edunanofab.utah.edu