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Comparison ledger

0010-03485 Magnet AssyversusFX 200

Applied Materials 0010-03485 Magnet Assy, KLA FX 200, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
OEMApplied MaterialsKLA
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyKLA FX 200
Specifications
ConfigurationWP AL 300mm PVD[1]—
OEMApplied Materials[1]KLA[6]
Model0010-03485[1]FX 200[6]
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]Film Measurement[7]
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]—
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Wafer Size—12inch (300mm)[5]
Category—METROLOGY(IQC)[5]
Equipment type—Thin Film Metrology Tool[5]
Part number—SPECTRA FX 200[8]
Sources (8)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]layla-ec.comlayla-ec.com
  6. [6]Equipment inventory listing
  7. [7]semi-sps.comsemi-sps.com
  8. [8]asseta.comasseta.com