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0010-13622 RF Match forversusIBS-2 Ion Beam

Applied Materials 0010-13622 RF Match for, Veeco IBS-2 Ion Beam, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-13622 RF Match forApplied Materials
OEMApplied MaterialsVeeco
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-13622 RF Match forVeeco IBS-2 Ion Beam
Specifications
ConfigurationHigh Efficiency HE RF Match-Bias[1]6 targets[2]
Model0010-13622[1]—
Product TypeRF Match for PVD (Physical Vapor Deposition)[1]—
FeatureHigh Efficiency HE RF Match-Bias[1]—
Type—Ion Beam Deposition (IBD)[2]
Category—Deposition[3]
Wafer size—6 inch[2]
Targets—6 targets[2]
Ion guns—Two ion guns[2]
Ion beams—2 fully functional ion beams[2]
Neutralizer—Plasma Bridge Neutralizer[2]
Vacuum and pumping—Refurbished turbo pump; 2 cryo pumps; 2 Edwards XDS10 scroll pumps[2]
Chiller—Chiller unit[2]
Air compressor—New air compressor[2]
RF generator—Upgraded with a new RF generator[2]
Chucks—6" chuck for round wafers; 7" chuck for square wafers[2]
Tool family—Veeco IBS-2 Ion Beam family, 1 entry[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com
  4. [4]waferpedia.comwaferpedia.com