Comparison ledger
Applied Materials 0010-13622 RF Match for, Veeco Spector Ion Beam, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | Spector Ion BeamVeeco |
|---|---|---|
| OEM | Applied Materials | Veeco |
| Category | Deposition | Deposition |
| Wafer size | — | Wafer Stage Motor & Drive |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Veeco Spector |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | Missing Cryo pump and compressor[2] |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Target Assembly | — | 2 sets (including magnets)[3] |
| Magnetron Amplifier (SR810, SR830) | — | 2 sets[3] |
| Wafer size | — | Wafer Stage Motor & Drive[3] |
| Optical Components | — | Removed, Only ion source control module retained[3] |
| Heating System | — | Controller modified[3] |
| 16 Ion Source | — | Normal[3] |
| 12 Ion Source | — | Normal[3] |
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