Comparison ledger
Applied Materials 0010-16392 ESC Assembly, Plasma-Therm SLR 770 RIE, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-16392 ESC AssemblyApplied Materials | SLR 770 RIEPlasma-Therm |
|---|---|---|
| OEM | Applied Materials | Plasma-Therm |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-16392 ESC Assembly | Plasma-Therm SLR 770 |
| Specifications | ||
| OEM | Applied Materials[1] | — |
| Model | 0010-16392[1] | — |
| Type | ESC Assembly[1] | — |
| Wafer Size | 300 mm[2] | — |
| Electrode Configuration | Dual[2] | — |
| Voltage | — | 208 V[3] |
| Frequency | — | 60 Hz[3] |
| Configuration | — | RF power supply has a water leak[3] |
| Process capabilities per chamber | — | RIE or PE adjustable[4] |
| Top electrode gap | — | Adjustable[4] |
| Pumping | — | TMP turbo pumps[4] |
| Gas lines per chamber | — | 8 gas lines and MFCs[4] |
| Maximum wafer size | — | up to 8 inch wafers[5] |
| Electrical | — | 208 V - 60 Hz[3] |
| Vintage | — | 1994 Vintage[3] |
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