Waferpedia

Comparison ledger

0010-16392 ESC Assemblyversus901G

Applied Materials 0010-16392 ESC Assembly, Tegal 901G, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-16392 ESC AssemblyApplied Materials
901GTegal
OEMApplied MaterialsTegal
CategoryEtchEtch
Wafer size—75 mm to 150 mm round substrates; square and rectangular substrates
Process node——
Introduced—1999
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-16392 ESC AssemblyTegal 901G
Specifications
OEMApplied Materials[1]—
Model0010-16392[1]—
TypeESC Assembly[1]—
Wafer Size300 mm[2]—
Electrode ConfigurationDual[2]—
Tool type—diode plasma etcher[3]
Configuration—special configuration for GaAs processing[3]
Configured features—special sensors and electrode designs[4]
Intended applications on platform—pad, zero layer, non-selective nitride, backside, planarization, oxide, nitride, poly, and III-V materials applications such as GaAs[4]
Substrate sizes on platform—75 mm to 150 mm round substrates as well as square and rectangular substrates[4]
Equipment Type—Diode plasma etcher[3]
Process—Plasma etching[3]
Substrate Size—75 mm to 150 mm round substrates; square and rectangular substrates[4]
Series—900 series[3]
Installed Base (900 Series)—More than 1,300 systems worldwide[3]

Plan your fab

Building a Etch process? Get a complete equipment list.

Open the fab equipment planner →
Sources (4)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]spwindustrial.comspwindustrial.com
  3. [3]web.archive.orgweb.archive.org
  4. [4]web.archive.orgweb.archive.org