Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, Nikon S 308 F, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | S 308 FNikon |
|---|---|---|
| OEM | Applied Materials | Nikon |
| Category | — | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | Nikon S 308 F |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | — |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Configuration | — | HDD included[3] |
| Light source | — | ArF (193 nm)[4] |
| Numerical aperture | — | 0.92[4] |
| Exposure area | — | 26 x 33 mm[4] |
| Reduction ratio | — | 1:4[4] |
| Resolution | — | <65 nm[4] |
| Throughput (300 mm) | — | >145 wph[4] |
| Throughput (200 mm) | — | >165 wph[4] |
| Wafer size | — | 200/300 mm[4] |
| Overlay accuracy | — | 8 nm[4] |
| Polarization control | — | POLANO[4] |
| Wafer size (alternative) | — | 12 inch[3] |
| Wavelength | — | 193 nm[4] |
| Lens NA | — | 0.92[4] |
| Polarization Control | — | POLANO (optional)[4] |