Waferpedia

Comparison ledger

0020 17485 PartversusMark-40

Applied Materials 0020 17485 Part, CHA Mark-40, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 17485 PartApplied Materials
OEMApplied MaterialsCHA
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 17485 PartCHA Mark 40
Specifications
ConfigurationStrap, RF Out 2 Balanced Coil Match, Hdp[1]—
System type—Vacuum Evaporation System[2]
Positioning—Combines the best features of the Mark 50 system with a broad array of options[2]
Flexibility—Accommodates a wide variety of deposition equipment[2]
Configuration support—Supports versatile combinations of deposition sources and substrates fixturing[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]web.archive.orgweb.archive.org