Comparison ledger
ASML Twinscan NXT 2050 i Immersion, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1000 FamilyUltratech | |
|---|---|---|
| OEM | ASML | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASML Twinscan NXT 2050 i Immersion | Ultratech 1000 Family |
| Specifications | ||
| Wafer size | 12 inch[1] | — |
| Exposure wavelength | 193 nm ArF[2] | — |
| Optics type | Immersion[2] | — |
| Stage design | Dual-stage[2] | — |
| Throughput | well above 250 wafers per hour under volume conditions[2] | — |
| Tool type | — | Photolithography step-and-repeat 1X stepper[3] |
| Optical design | — | Wynne Dyson[3] |
| Magnification | — | 1X[3] |
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