Comparison ledger
Axcelis 200 ACU, STS ICP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 200 ACUAxcelis | ICPSTS |
|---|---|---|
| OEM | Axcelis | STS |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Axcelis NV GSD 200 | STS ICP |
| Cited variants | — | |
| Specifications | ||
| Configuration | Parts Machine[3] | — |
| Manufacturer | Axcelis[3] | — |
| Model | 200 ACU[3] | — |
| Tool type | Asher[3] | Inductively coupled plasma etcher[7] |
| Wafer size | 200mm[5] | 100 mm wafers[2] |
| Serial number | AU6A356AH[5] | — |
| Computer system | M 200 PC, M 200[6] | — |
| Part number | SC 4572 A[6] | — |
| Volts | 208[6] | — |
| Amps | 30[6] | — |
| Equipment type | Asher[3] | — |
| Wafer configuration | 8 inch[4] | — |
| Voltage | — | 400 V[7] |
| Frequency | — | 50 Hz[7] |
| Technology | — | Inductively Coupled Plasma (ICP)[7] |
| Electrical configuration | — | 400 V, 50 Hz[7] |
| Process class | — | Dry etcher[2] |
| Chemistry | — | Chlorine and bromine chemistry[2] |
Plan your fab
Building a Etch process? Get a complete equipment list.
Open the fab equipment planner →