Waferpedia

Comparison ledger

200 PCUversusEPX 180 NE

Axcelis 200 PCU, Edwards EPX 180 NE, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
200 PCUAxcelis
EPX 180 NEEdwards
OEMAxcelisEdwards
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones2000 Vintage2008 Vintage year
Control system——
Generation——
FamilyAxcelis NV GSD 200Edwards EPX 180 NE
Cited variants
  • Fusion 200 PCU[1]
  • Fusion 200 PCU-P[2]
—
Specifications
P/NSC 4840 A[3]—
Frequency50 Hz[3]50/60 Hz[5]
Phase3 Phase[3]—
Voltage400 V[3]200/208V[5]
Pumping speed—106 CFM[4]
Ultimate vacuum—< 7 x 10^-5 Torr[4]
Inlet—ISO63[4]
Exhaust—KF25[4]
Weight—104 lbs[4]
Current—16 Amps[5]
Display and control panel—Integrated[5]
Gas purge—High temperature gas purge assembly[5]
Mounting—Metric eyebolt / heavy duty mount base[5]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]exapro.comexapro.com
  2. [2]fabsurplus.comfabsurplus.com
  3. [3]inventory listing
  4. [4]provac.comprovac.com
  5. [5]fab-spares.comfab-spares.com