Waferpedia

Comparison ledger

200 PCU Photoresist StabilizerversusGasonics Gamma 2130 Photoresist Stripper

Axcelis 200 PCU Photoresist Stabilizer, Lam Research Gasonics Gamma 2130 Photoresist Stripper, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMAxcelisLam Research
CategoryResist ProcessingResist Processing
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAxcelis NV GSD 200Lam Research Gasonics
Specifications
Configuration14 Amps[1]System Configuration:[3]
Voltage380 V[1]—
Frequency50 Hz[1]—
Phase3 Phase[1]—
Load Port—Brooks Fixload TM V6[3]
EFEM Robot—02-169208-00[3]
Aligner—Yaskawa[3]
RF Rack—Generator ENI GHW-50A-04 5ea[3]
Light Curtain—Keyence[3]
EPD—4ea(#2,#3,#4,#5 Port)[3]
RF Matcher—CPMX-3000 5ea[3]
RF Source—02-352103-00 5ea[3]
HDIS Pedestal—#2, #3, #,1, #6[3]
Fixed Pedestal—#4, #5[3]
Stage #1—Preheat[3]

Plan your fab

Building a Resist Processing process? Get a complete equipment list.

Open the fab equipment planner →
Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]inventory listing