Waferpedia

Comparison ledger

GSD 200 E 2 High CurrentversusViision 200

Axcelis GSD 200 E 2 High Current, Varian Viision 200, side by side. Every value shown is drawn from the cited encyclopedia entries.

Documented as functional equivalents— Same function class: Ion Implantation, null[1]
Side-by-side comparison of selected equipment models
Attribute
OEMAxcelisVarian
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run—1996–
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAxcelis GSD 200Varian Viision 200
Cited variants
  • Viision 200, 8" - Medium Current[2]
  • Viision 200, 8" - High Current - 3 Phase - 5 Wire - 208 Volt - 50/60 Hz 2000 Vintage[3]
  • Viision 200, 8" - High Current - 3 Phase - 5 Wire - 208 Volt - 50/60 Hz 2013 Vintage[4]
  • VIISion 80LE[5]
  • VIISion 200 PLUS2[5]
  • Viision 200 (Medium Current)[2]
  • VIISion 200 PLUS[5]
Specifications
Software VersionVM 8.0 (Virtual Machine)[1]—
CIMSECs[1]—
ProcessB11, BF2, As, P[1]—
Handler SystemArm (Non HPES), In Air Handler[1]—
Factory InterfaceNone[1]—
Option SystemSilicon Disk, SEF EGUN[1]—
ConfigurationBlade Server 120006095C Excluded[1]Medium Current[2]
Process SpeciesB11, BF2, As, P[1]—
Vintage2001[1]2000[3]
Disk DriveDirect-Drive[6]—
Dose TypeRegular[6]—
Source TypeELS4 IHC-Source without Vaporizer[6]—
Main WorkstationSUN Solaris AXI 3HE (special case)[6]—
Second WorkstationSUN Sparc5 on cart with printer[6]—
CIM InterfaceSECs[1]—
Wafer Size8 inch[1]—
High Voltage Transformerboth Oil/Light[6]—
Tower Colorred/yellow/green; no buzzer[6]—
Network24-port 100MB Ethernet with Cisco Router[6]—
Kit Cell Controller177[6]—
OptionsAccel-Highvoltage Probe installed, HPES-Upgrade installed[6]—
Phase—3 Phase[3]
Wafer size—8 inch (200 mm)[2]
Process type—Batch[5]
Current type—High Current[5]
Energy range (VIISion 200 PLUS2)—Up to 200 keV[5]
Energy range (VIISion 80LE)—250 eV to 80 keV[5]
Electrical requirements—3 Phase, 5 Wire, 208 V, 50/60 Hz[3]
Voltage—208 Volt[3]
Frequency—50/60 Hz[3]
Uptime—over 85%[5]
Equipment type—Ion implanter[2]
Model—Viision 200[2]
Current class—High current[5]

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Sources (7)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing
  3. [3]Equipment inventory listing
  4. [4]Equipment inventory listing
  5. [5]web.archive.orgweb.archive.org
  6. [6]inventory listing
  7. [7]Equipment inventory listing