Comparison ledger
CEE 100, EV Group 620 Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 100CEE | 620 MaskEV Group |
|---|---|---|
| OEM | CEE | EV Group |
| Category | Lithography | Lithography |
| Wafer size | 6" | 3 Station Wafer Handler |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | CEE 100 | EV Group 620 |
| Cited variants |
| — |
| Specifications | ||
| Tool type | Spray Developer[1] | — |
| Accepts wafer size | up to 6" wafers[2] | — |
| Programmable programs | 10 programs[2] | — |
| Steps per program | up to 10 steps[2] | — |
| Programmable step parameters | Acceleration, Speed, Time[2] | — |
| Associated document | CEE Model 100CB Spinner.doc[2] | — |
| Wafer size | Up to 6 inches[2] | 4 inch[3] |
| Programs | 10 programs each with up to 10 steps[2] | — |
| Control parameters | Acceleration, Speed, Time[2] | — |
| Voltage | — | 200 V[3] |
| Phase | — | 2 Phase[3] |
| Configuration | — | 50 / 60 Hz[3] |
| Current Rating | — | 10 A[3] |
| Interrupting Capability | — | 50 kiloamps[3] |
| Overcurrent Protection | — | Provided at machine terminals[3] |
| Frequency | — | 50/60 Hz[4] |
| Power consumption | — | 1.55 kW[4] |
| Full load current rating | — | 7.45 A[4] |
| Largest current rating | — | 7.45 A[4] |
| Breaker size / AIC | — | 10 A / 10 kA[4] |
| Compressed Air (CDA) | — | 6 bar / 87 psi[4] |
| Nitrogen or CDA | — | 6 bar / 87 psi[4] |
| Vacuum | — | < 850 mbar / 6460 torr[4] |
| Wafer Sizes | — | 2, 3, 4, 5, 6, 12 inch[4] |
| Backside Alignment | — | Capable[5] |
| Infrared Alignment | — | Capable[5] |
| Chuck Size | — | 5 inch to 6 inch[5] |
| OEM | — | EV Group[3] |
| Model | — | 620 Mask[3] |
| Equipment type | — | Mask Aligner[3] |
| Category | — | Lithography[3] |
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