Comparison ledger
EV Group 101, Nikon NSR S 307 E, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 101EV Group | NSR S 307 ENikon |
|---|---|---|
| OEM | EV Group | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | Wafer X-Axis is out of order |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 101 | Nikon NSR |
| Specifications | ||
| OEM | EV Group[1] | — |
| Model | 101[1] | — |
| Equipment name | EVG 101 Spray Coater[1] | — |
| NEMO ID | evgspraycoat[1] | — |
| Training required | EVG 101 Training[1] | — |
| Training duration | 1.50 hours[1] | — |
| Processing technique | Resist Spray Coat (manual)[1] | — |
| Cleanliness | "All"[1] | — |
| Location | SNF Paul G Allen L107 Cleanroom[1] | — |
| Wafer diameter (substrate size) | up to 300 mm[2] | — |
| Available modules | Spin coat / OmniSpray® / develop[2] | — |
| Wafer handling options | Bowed / warped / thin wafer handling, edge handling[2] | — |
| Dispense options | Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[2] | — |
| Processing technique (at SNF) | Resist Spray Coat (manual)[3] | — |
| Cleanliness group (at SNF) | "All"[1] | — |
| Wafer | — | 300 mm[4] |
| Exposure Light Source | — | ArF excimer laser[4] |
| Wavelength | — | 193[4] |
| Resolution | — | 80 nm[5] |
| Alignment Accuracy | — | 12 nm[4] |
| Exposure Field | — | 26 x 33 mm[4] |
| Reduction Ratio | — | 1:4[4] |
| Wafer size | — | Wafer X-Axis is out of order[4] |
| Configuration | — | Hard Disk, 300mm[6] |
| Light Source | — | ArF excimer laser[4] |
| Lens NA | — | 0.85[5] |
| Lens Data | — | Cymer XLA 140[6] |
| Wafer Size Support | — | 200 mm / 300 mm[5] |
| Throughput (300 mm) | — | > 112 WPH[5] |
| Throughput (200 mm) | — | > 160 WPH[5] |
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