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1 EC 101 R 485 Photoresist Spinnerversus86

Headway 1 EC 101 R 485 Photoresist Spinner, SVG 86, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
86SVG
OEMHeadwaySVG
CategoryResist ProcessingResist Processing
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyHeadway 1 EC 101 R 485 Photoresist SpinnerSVG 86
Specifications
Vacuum requirement23" Hg[1]—
Electrical115 V, 3 A, 50/60 Hz, 1 Ø (single phase)[1]—
Electrical power115 V, 3 A, 50/60 Hz, 1 Ø (single phase)[1]—
Track 1—Sender - Coat - Receiver[2]
Track 2—Sender - Developer - Receiver[2]
Type—Coater/Developer[2]
Wafer size range—2" to 200mm[3]
Wafer shape—Round and square[3]
Robotic wafer handling—Yes[3]
Control—PC-based graphical user programming, touch screen control[3]
Recipe management software—Nettrack[3]
Barcode input—Optional[3]
Track configuration—Track 1: Sender - Coat - Receiver; Track 2: Sender - Developer - Receiver[2]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]ltnsemi.comltnsemi.com