Comparison ledger
Hitachi SU8230, KLA .498 PSL Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | SU8230Hitachi | |
|---|---|---|
| OEM | Hitachi | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Hitachi SU8230 | KLA .498 PSL Wafer |
| Specifications | ||
| Role | Cleanroom scanning electron microscope (SEM)[1] | — |
| Facility reference | SEM-10[1] | — |
| Manufacturer | Hitachi[1] | — |
| Model | SU8230[1] | — |
| Training prerequisite note | Qualification on the SEM-10 Hitachi SU8230 is a prerequisite to SP-4 training and access.[1] | — |
| Instrument type | Field Emission Gun Scanning Electron Microscope (FEGSEM)[2] | — |
| Gun type | Cold field emission (CFE) gun[3] | — |
| Resolution at 15 kV | 0.8 nm at 15 kV and 4.0 mm working distance[2] | — |
| Resolution at 1.0 kV | 1.1 nm at 1.0 kV landing voltage and 1.5 mm working distance[2] | — |
| Landing voltage range | 30 kV to 0.01 kV[2] | — |
| Beam deceleration mode landing voltage range | 0.01 kV to 2 kV[2] | — |
| Magnification range in high magnification mode | 100X to 1,000,000X[2] | — |
| Magnification range in low magnification mode | 20X to 2000X[2] | — |
| Sample chamber | 6 inch sample chamber[2] | — |
| Cryo trap | Integrated LN2 cryo trap[2] | — |
| Stage | 5-axis motorized stage[2] | — |
| Non-cryo stage travel | X/Y 0-110 mm; Z 1.5-40 mm; Tilt -5 to +70; Rotation 360[2] | — |
| Cryo stage travel | X/Y approximately +/- 9 mm; Z 1.5-40 mm; Tilt 30 at Z=8 mm or greater, 15 at 5 mm, 0 at 1.5 mm; Rotation 0[2] | — |
| Vacuum system | Specimen chamber turbo + scroll dry pump; gun/column ion pumps x3 plus non-evaporative getter[2] | — |
| Configuration | — | NIST Traceable[4] |
| NIST traceability | — | Yes[4] |
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