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Comparison ledger

0035235-003 MMD Headversus600i

KLA 0035235-003 MMD Head, Nova 600i, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
600iNova
OEMKLANova
CategoryMetrology & InspectionMetrology & Inspection
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyKLA 0035235-003 MMD HeadNova 600i
Specifications
ConfigurationTSTD PCB ASSY, MMD MEAS HEAD[1]—
Model0035235-003[1]Nova 600i Dual Beam[2]
MakeKLA[1]—
Part DescriptionTSTD PCB ASSY, MMD MEAS HEAD[1]—
Compatible SystemKLA AIT-XP[1]—
OEM—FEI[2]
Category—Focused Ion Beam (FIB)-SEM[2]
Beam configuration—Dual-beam system combining Ga FIB with FESEM (thermal field emitter)[2]
Gas injection—Multiple gas injector system for deposition of Pt and SiO₂[2]
Manipulator—PC-controlled nanometer-resolution manipulator[2]
Capability—TEM sample preparation capability[2]
Electron beam resolution @ optimum WD—1.1 nm @ 15 kV; 2.5 nm @ 1 kV[3]
Electron beam resolution @ coincident point—1.5 nm @ 15 kV; 2.0 nm @ 5 kV[3]
Ion beam resolution @ coincident point—7.0 nm @ 30 kV (5.0 nm achievable)[3]
Electron beam accelerating voltage—200 V to 30 kV[3]
Ion beam accelerating voltage—500 V to 30 kV[3]
Electron beam probe current—≤ 20 nA in 21 steps[3]
Ion beam probe current—1.5 pA to 20 nA (15 position aperture strip)[3]
Stage travel (X,Y)—150 mm, piezo-driven[3]
Maximum sample diameter—150 mm[3]
Detectors—In-lens TLD (SE and BSE), Everhardt Thornley SED, IR camera[3]
Column angle—52° between electron and ion columns[3]
Gas injection system—Up to 5 injectors; common chemistries include Pt, W, C, and enhanced etch[3]
Operating system—Windows XP SP2[3]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]colorado.educolorado.edu
  3. [3]yumpu.comyumpu.com
  4. [4]tssmicroscopy.comtssmicroscopy.com