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Comparison ledger

ALD-150LXversusSimba2

Kurt Lesker ALD-150LX, Temescal Simba2, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
ALD-150LXKurt Lesker
Simba2Temescal
OEMKurt LeskerTemescal
CategoryDepositionDeposition
Wafer size150mm150mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyKurt Lesker ALD-150LXTemescal Simba2
Specifications
OEMKurt Lesker[1]—
ModelALD-150LX[1]—
Load-lockedYes[2]—
In situ ellipsometerFilm Sense FS-1 Multi-Wavelength[2]—
Available film growth by requestAl2O3, HfO2, ZrO2, HfZrO2, TiN, Ga2O3[2]—
Maximum film thickness statedup to 20 nm[2]—
Substrate specificationNo exposed organics such as polymers[2]—
Small samplesAble to be clipped to wafer carrier[2]—
Power supply—15-kW Temescal Simba2[3]
System association—Listed as an upgrade option for FC-4400[3]
Power rating—15 kW[6]
Product type—Power supply[7]
Function—E-beam power supply[8]
Associated systems—FC-4400, UEFC-5700, FC/BCD-2800[9]
Manufacturer—Temescal[7]

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Sources (9)Every fact above is drawn from these public sources
  1. [1]smif.pratt.duke.edusmif.pratt.duke.edu
  2. [2]smif.pratt.duke.edusmif.pratt.duke.edu
  3. [3]web.archive.orgweb.archive.org
  4. [4]web.archive.orgweb.archive.org
  5. [5]web.archive.orgweb.archive.org
  6. [6]waferpedia.comwaferpedia.com
  7. [7]semi-sps.comsemi-sps.com
  8. [8]semi-sps.comsemi-sps.com
  9. [9]waferpedia.comwaferpedia.com