Comparison ledger
Lam Research 2300 Kiyo GX RIE, Oxford Instruments 100 ICP Fluorine, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 2300 Kiyo GX RIELam Research | 100 ICP FluorineOxford Instruments |
|---|---|---|
| OEM | Lam Research | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research 2300 | Oxford Instruments 100 ICP Fluorine |
| Specifications | ||
| Configuration | Poly[1] | — |
| Film Type | Polysilicon[1] | — |
| FOUP Ports | 4[1] | — |
| Turbo Pump | Edwards / STP-iXA3306CV[1] | — |
| Chiller Unit | ATS / MPX-45FN / 6 units[1] | — |
| OEM | Lam[1] | — |
| Model | 2300 Kiyo GX[1] | — |
| Equipment type | Reactive Ion Etcher (RIE)[1] | — |
| Tool type | Reactive Ion Etcher (RIE)[1] | — |
| Etch Gases | — | SF6, CF4, O2, Ar, N2, CHF3, C4F8[3] |
| Cryo DRIE etch rate | — | up to 5 µm/min[3] |
| Wafer size | — | 4 inch, 6 inch, 8 inch (with clamp change)[3] |
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