Comparison ledger
Lapmaster 120 Continuous, Strasbaugh 6 EC CMP Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 120 ContinuousLapmaster | 6 EC CMP WaferStrasbaugh |
|---|---|---|
| OEM | Lapmaster | Strasbaugh |
| Category | CMP | CMP |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lapmaster 120 Continuous | Strasbaugh 6 EC CMP Wafer |
| Specifications | ||
| Make | — | Strasbaugh[1] |
| Model | — | 6 EC CMP[1] |
| System type | — | CMP Wafer Polisher[1] |
| System description | — | Economical tool for CMP research, failure analysis, and low-volume production[2] |
| Operation | — | Semi-automatic[2] |
| GUI | — | Color, touch-screen GUI[2] |
| Table and spindle motors | — | Closed-loop table and spindle RPM motors[2] |
| Pad conditioning | — | Programmable pad conditioning[2] |
| Programmable control zones | — | 20 zones[2] |
| Programmable control parameters | — | Dwell time, down force, and RPM[2] |
| Pad conditioning media | — | Diamond plated disk or nylon brush[2] |
| Option | — | ViPRR carriers[2] |
| Asset # | — | 73620[1] |
| Operating mode | — | semi-automatic[2] |
| User interface | — | color, touch-screen GUI[2] |
| Process control zones | — | 20 zones of programmable control[2] |
| Facility utility requirements | — | DI Water: 30 psi minimum, 1.5 GPM flow rate; Vacuum: 25" HG; Air: 100 psi, 5 SCFM; Electrical: 208 or 230 VAC, 3 phase, 60 Hz, 20 AMPS with conditioner, 30 AMPS; Exhaust: approx. 100 CFM[2] |
| Pad conditioning tools | — | diamond plated disk or nylon brush[2] |
| Options | — | ViPRR carriers[2] |