Comparison ledger
Lapmaster 15 Lapper, Ontrak DSS 200 Post, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 15 LapperLapmaster | DSS 200 PostOntrak |
|---|---|---|
| OEM | Lapmaster | Ontrak |
| Category | CMP | CMP |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lapmaster 15 | Ontrak DSS 200 |
| Cited variants | — | |
| Specifications | ||
| Number Of Conditioning Rings | Up to 3[4] | — |
| Ring ID | Up to 5.5″[4] | — |
| Plate Diameter – Outside | 15″[4] | — |
| Plate Diameter – Inside | 3 1/2″[4] | — |
| Standard RPM | 60[4] | — |
| Drive Motor | 1/2 HP[4] | — |
| Electrics | 110V / 1Ph / 60Hz[4] | — |
| Dimensions – Approximate | 26″(L-R) x 21″(F-B) x 22″(H)[4] | — |
| Configuration | Equipped with:[4] | With Hepa Mini-Environment[5] |
| Equipped with: 15″ Cast Iron Plate | Included[4] | — |
| Equipped with: (3) Yoke/Roller Bearing Assemblies | Included[4] | — |
| Equipped with: (3) Conditioning Rings | Included[4] | — |
| Equipped with: (3) Hold Downs | Included[4] | — |
| Equipped with: 30 Minute Timer | Included[4] | — |
| Tool type | — | double-sided PVA scrubber[2] |
| Wafer size range | — | 100mm to 200mm[1] |
| Throughput | — | 45-65 wafers per hour[2] |
| Post-CMP cleaning applications | — | oxide, polysilicon, nitride, tungsten, aluminum and copper[2] |
| Type | — | Double-sided PVA scrubber / post-CMP cleaner[2] |
| Wafer sizes (listing) | — | 8 inch[5] |
| Cleanroom environment (listing) | — | With HEPA mini-environment[5] |
| Brush type | — | Roller PVA[3] |
| Downforce control | — | Yes[3] |
| Drying method | — | Spin + heat lamp[3] |
| NH4OH dispense | — | Yes[3] |