Comparison ledger
Logitech 1 DP 41, Logitech EP1, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1 DP 41Logitech | EP1Logitech |
|---|---|---|
| OEM | Logitech | Logitech |
| Category | CMP | CMP |
| Wafer size | — | 100mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Logitech 1 DP 41 | Logitech EP1 |
| Specifications | ||
| Phase | 3 Phase[1] | — |
| Configuration | 50/60 Hz[1] | — |
| Voltage | 480 V[1] | — |
| Make | Logitech[1] | — |
| Model | 1 DP 41[1] | — |
| Frequency | 50/60 Hz[1] | — |
| Current | 12 amps[1] | — |
| Product family | — | EP Polishing Pads and Cloths[2] |
| Application type | — | Chemical Mechanical Polishing (CMP)[2] |
| Suitable applications | — | oxide, nitride and copper[2] |
| Type | — | Chemical Mechanical Polishing (CMP) cloths and pads[2] |
| Suitable materials | — | Oxide, nitride and copper[2] |
| Product type | — | Chemical Mechanical Polishing (CMP) polishing cloths and pads[2] |
| Applications | — | oxide, nitride, and copper[2] |
| Associated wafer process capacity | — | up to 100mm/4"[3] |