Comparison ledger
Logitech 1 DP 41, Ontrak DSS 200 Post, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1 DP 41Logitech | DSS 200 PostOntrak |
|---|---|---|
| OEM | Logitech | Ontrak |
| Category | CMP | CMP |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Logitech 1 DP 41 | Ontrak DSS 200 |
| Cited variants | — | |
| Specifications | ||
| Phase | 3 Phase[4] | — |
| Configuration | 50/60 Hz[4] | With Hepa Mini-Environment[5] |
| Voltage | 480 V[4] | — |
| Make | Logitech[4] | — |
| Model | 1 DP 41[4] | — |
| Frequency | 50/60 Hz[4] | — |
| Current | 12 amps[4] | — |
| Tool type | — | double-sided PVA scrubber[2] |
| Wafer size range | — | 100mm to 200mm[1] |
| Throughput | — | 45-65 wafers per hour[2] |
| Post-CMP cleaning applications | — | oxide, polysilicon, nitride, tungsten, aluminum and copper[2] |
| Type | — | Double-sided PVA scrubber / post-CMP cleaner[2] |
| Wafer sizes (listing) | — | 8 inch[5] |
| Cleanroom environment (listing) | — | With HEPA mini-environment[5] |
| Brush type | — | Roller PVA[3] |
| Downforce control | — | Yes[3] |
| Drying method | — | Spin + heat lamp[3] |
| NH4OH dispense | — | Yes[3] |