Comparison ledger
Nikon SF 130, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | SF 130Nikon | 1000 FamilyUltratech |
|---|---|---|
| OEM | Nikon | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon SF 130 | Ultratech 1000 Family |
| Specifications | ||
| Operating System | Windows[1] | — |
| Configuration | With:[1] | — |
| Manufacturer | Nikon[1] | — |
| Model | SF 130[1] | — |
| Category | Lithography[2] | — |
| Light Source | i-line mercury lamp (365 nm wavelength)[3] | — |
| Exposure Wavelength | 365 nm[4] | — |
| Max Wafer Size | 200 mm[4] | — |
| Numerical Aperture | ~0.50[4] | — |
| Throughput | about 100 wafers per hour[4] | — |
| Common Process Node | ≥ 0.25 μm[4] | — |
| Tool type | lithography stepper[2] | Photolithography step-and-repeat 1X stepper[5] |
| Optical design | — | Wynne Dyson[5] |
| Magnification | — | 1X[5] |
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