Comparison ledger
OAI 200 Mask, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 200 MaskOAI | 1000 FamilyUltratech |
|---|---|---|
| OEM | OAI | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | OAI 200 Mask | Ultratech 1000 Family |
| Cited variants |
| — |
| Specifications | ||
| Configuration | Double Sided[2] | — |
| Model | 200[2] | — |
| Type | tabletop mask aligner[1] | — |
| Resolution | one micron[1] | — |
| Alignment precision | one micron[1] | — |
| Alignment accuracy | 2 µm[3] | — |
| Objectives | 5x, 10x, and 2x objectives[3] | — |
| Exposure modes | contact, soft-contact, and proximity[4] | — |
| Light source options | collimated Hg lamp UV light source or UV LED light source[1] | — |
| UV LED wavelengths | 365nm, 405nm, or 436nm[1] | — |
| Chuck | dual windows in chuck for 4" wafers[2] | — |
| Alignment axes | X, Y, and Z micrometers[1] | — |
| Frontside alignment | designed for high-precision frontside alignment in microfabrication processes[3] | — |
| Tool type | — | Photolithography step-and-repeat 1X stepper[5] |
| Optical design | — | Wynne Dyson[5] |
| Magnification | — | 1X[5] |
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