Comparison ledger
Oxford Instruments 100 ICP Fluorine, Tegal 900e, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 100 ICP FluorineOxford Instruments | 900eTegal |
|---|---|---|
| OEM | Oxford Instruments | Tegal |
| Category | Etch | Etch |
| Wafer size | — | 150mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Oxford Instruments 100 ICP Fluorine | Tegal 900e |
| Cited variants | — | |
| Specifications | ||
| Etch Gases | SF6, CF4, O2, Ar, N2, CHF3, C4F8[2] | — |
| Cryo DRIE etch rate | up to 5 µm/min[2] | — |
| Wafer size | 4 inch, 6 inch, 8 inch (with clamp change)[2] | 3 in to 150 mm wafers[1] |
| Tool type | — | single wafer cassette-to-cassette etch system[1] |
| Process | — | non-critical plasma etch processes[1] |
| Control system | — | Advanced Control System (ACS) field upgrades available for customers already invested in the Tegal 900e Series[1] |
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