Waferpedia

Comparison ledger

SU 3200 Single Waferversus1000P

SCREEN SU 3200 Single Wafer, YES 1000P, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMSCREENYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones—1998 Acquisition
Control system——
Generation——
FamilySCREEN SU 3200 Single WaferYES 1000P
Specifications
Typesingle-wafer cleaner[1]—
Wafer size12 inch[2]—
Expandable chambersup to 12 chambers[1]—
Throughputup to 800 wafers per hour[1]—
Process compatibilitycompatible with processes for 28 nm node and lower[3]—
MakeSCREEN / DNS[2]—
ModelSU 3200[2]1000P[5]
Tool typeSingle Wafer Cleaner[1]—
Maximum throughputup to 800 wafers per hour[1]—
Maximum chambersup to 12 chambers[1]—
Chamber arrangement12 chambers in four three-level towers[1]—
Chemical supply systemdynamic direct injection (DDI) or cabinet-type chemical supply system[1]—
Communication protocolSECS/GEMS[4]—
Wafer handlerKawasaki robot[4]—
System power rating208AC-3 Phase[4]—
Software versionP2485STD00V2485STD00[4]—
System type—Plasma cleaning system[5]
Shelf configuration—Four 16 x 16 inch shelves[5]
Total capacity—1024 square inches[5]
Control system—PLC driven with plain English real time process readout and diagnostics in the event of system abort[5]
Number of shelves—4[5]
Shelf size—16 x 16 inches[5]
Power—1000 W[6]
Configuration—Parallel plate[6]
Operation modes—Active, RIE, Downstream[5]
Sample size range—From smallest semiconductor chip to large flat panels[5]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]screen.co.jpscreen.co.jp
  2. [2]Equipment inventory listing
  3. [3]nanoindustry.sunanoindustry.su
  4. [4]waferpedia.comwaferpedia.com
  5. [5]web.archive.orgweb.archive.org
  6. [6]semistarcorp.comsemistarcorp.com