Comparison ledger
SUSS MicroTec MA 8 BA 8 Mask, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | MA 8 BA 8 MaskSUSS MicroTec | 1000 FamilyUltratech |
|---|---|---|
| OEM | SUSS MicroTec | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | High precision micrometer for wafer alignment adjustment | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SUSS MicroTec MA 8 Mask | Ultratech 1000 Family |
| Specifications | ||
| Configuration | Backside Optical Alignment[1] | — |
| Wafer Loading | Manual loading & unloading[1] | — |
| Microscope Lenses | 2× 5× lenses, 2× 10× lenses[1] | — |
| Power | 1000 W UV mercury lamp[1] | — |
| Wafer size | High precision micrometer for wafer alignment adjustment[1] | — |
| Micrometer axes | X / Y / θ (theta)[1] | — |
| X / Y minimal travel | 10 mm[1] | — |
| θ-axis maximum rotation angle | ±5°[1] | — |
| Tool type | — | Photolithography step-and-repeat 1X stepper[2] |
| Optical design | — | Wynne Dyson[2] |
| Magnification | — | 1X[2] |
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