Comparison ledger
Tokyo Electron Expedius, YES 1000P, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | ExpediusTokyo Electron | 1000PYES |
|---|---|---|
| OEM | Tokyo Electron | YES |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 1998 Acquisition |
| Control system | — | — |
| Generation | — | — |
| Family | Tokyo Electron Expedius | YES 1000P |
| Specifications | ||
| Configuration | single block[1] | Parallel plate[4] |
| Wafer size capability | 5 to 8 inches[2] | — |
| Platform | CLEAN TRACK MARK 7[2] | — |
| Cleaning capability | Both sides of wafer[2] | — |
| Transfer system | Vacuumless robotic transport[2] | — |
| Chuck type | Mechanical and vacuum chucks[2] | — |
| Brush pressure control | Automatic brush pressure controller[2] | — |
| Optional cleaning modules | High-pressure jet spray or megasonic clean[2] | — |
| Host communication | GEM host communication[2] | — |
| Interface | SMIF interface[2] | — |
| Compliance | S2-93 and CE mark[2] | — |
| OEM | Tokyo Electron[1] | — |
| Model | Expedius[1] | 1000P[3] |
| Equipment type | Wet Bench[1] | — |
| Wafer capability | 5 inch to 8 inch[2] | — |
| Wafer transfer | non-vacuum wafer transfer capability[2] | — |
| System type | — | Plasma cleaning system[3] |
| Shelf configuration | — | Four 16 x 16 inch shelves[3] |
| Total capacity | — | 1024 square inches[3] |
| Control system | — | PLC driven with plain English real time process readout and diagnostics in the event of system abort[3] |
| Number of shelves | — | 4[3] |
| Shelf size | — | 16 x 16 inches[3] |
| Power | — | 1000 W[4] |
| Operation modes | — | Active, RIE, Downstream[3] |
| Sample size range | — | From smallest semiconductor chip to large flat panels[3] |
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