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0216 7696, E 11368072 ESCversusE 500 EHPI Ion Implant

Varian 0216 7696, E 11368072 ESC, Varian E 500 EHPI Ion Implant, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMVarianVarian
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run—2000–
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyVarian 0216 7696, E 11368072 ESCVarian E 500 EHPI Ion Implant
Specifications
ConfigurationPlaten ADV-S Type[1]CE Mark[3]
TypeESC Platen ADV-S Type[1]—
CategoryIon Implantation[2]—
Power—208 V,50/60 Hz, 3 Phase[3]
Connection—Top[3]
Source 1—IHC[3]
Extraction Electrode—EHP[3]
Bushing—EHP[3]
Wafer Size—6 inch[3]
CE Mark—Yes[3]
Vintage—2000[3]
Control Computer—Windows 7[3]
Software Version—V15.10.12[3]
Chuck system—ESC[3]
Computer—Win7[3]
Software—V15.10.12[3]
Source Turbo—Pfeiffer[3]
Analyzer Turbo—Pfeiffer[3]
Scanner Turbo—Pfeiffer[3]
LoadLock right—Cryo[3]
LoadLock left—Cryo[3]
Source/Terminal—Edwards Setup[3]
Differential Seal—Busch Scroll Fossa 15[3]
End station / Load Lock—Edwards Setup[3]
Cryo Comp—9700A[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]inventory listing