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Comparison ledger

Waferstorm M 3305 Lift Offversus1000FP

Veeco Waferstorm M 3305 Lift Off, YES 1000FP, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMVeecoYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer sizeRobotic Wafer Handler:—
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyVeeco WaferstormYES 1000FP
Cited variants—
Specifications
Configuration300 Series[1]—
Spin Chuck150 mm (Centrifugal Edge Grip)[1]—
Voltage415 VAC[2]—
Frequency50 Hz[2]—
Phase3 Phase[2]—
Wafer Size150 mm[1]—
Power Requirements (Listing 1)415 VAC, 50 Hz, 3 Phase, 30 A[3]—
Power Requirements (Listing 2)415 VAC, 50 Hz, 3 Phase[2]—
Vintage (Listing 2)2010[2]—
Vintage (Listing 3)2010[3]—
Spin Chuck Type150 mm Centrifugal Edge Grip[1]—
Cassette LoadingQty 2 Horizontal Cassette Loading with 2 MCPs (8 total 150 mm Cassettes)[1]—
Operating SystemWindows 10[1]—
SECS/GEMYes[1]—
ESD ConfigurationUPLA Filter with Air Ionizer Bar (Standard ESD Configuration)[1]—
Fire SuppressionCO2 Fire Suppression System for 180" Frame: IR Detector, 120 Degrees Viewing Angle & Linear Heat Detector Wire[1]—
Wafer sizeRobotic Wafer Handler:[1]—
System type—Plasma cleaning system[4]
Line—R-Series Plasma Cleaning Systems (Glen Technologies)[4]
Model—Glen/YES 1000FP[4]
Designed use—Designed to accept a range of shelf sizes[4]
Application focus—Changing needs of the flat panel industry[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]web.archive.orgweb.archive.org