Aixtron G 5 MOCVD Reactor

Models in this family

1. 

   G 5 MOCVD Reactor

   The Aixtron G 5 is a MOCVD reactor for compound semiconductors, used for deposition of materials such as SiC and GaN.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   AIX G5+ C	—	—	Optimized for GaN applications on 150/200 mm substrates with Cl2 in-situ cleaning and 5x200 mm or 8x150 mm configuration.	aixtron.com[1]
   AIX G5 WW C	—	—	Optimized for SiC power electronics with hot wafer transfer and 8x150 mm configuration.	aixtron.com[2]

Sources