Tool family
The ASML Twinscan 1200 B is a lithography scanner equipped with a Cymer XLA 160 laser, but it is non-operational due to an internal water leak near the lens and has no lens data available.
The ASML Twinscan 1950 i is an immersion scanner used in semiconductor lithography.
The ASML Twinscan AT 1100 is a 193 nm ArF laser-based lithography scanner that processes 200 mm and 300 mm wafers using dual-wafer stage technology.
The ASML Twinscan AT 400 S is an i-line scanner stated to be a 365 nm system from 2001.
The ASML Twinscan AT 750 B is a semiconductor tool identified with a Cymer ELS 6600 laser and a Tel Lithius Track configuration.
The ASML Twinscan NXT 1980 i is a 12-inch wafer lithography scanner that was upgraded from the 1970i model.
ASML Twinscan XT 1950 Hi is a scanner for 12-inch wafers used for 193 nm immersion lithography with 38 nm resolution capacity.
The ASML Twinscan 1200 B is a lithography scanner equipped with a Cymer XLA 160 laser, but it is non-operational due to an internal water leak near the lens and has no lens data available.
The ASML Twinscan 1950 i is an immersion scanner used in semiconductor lithography.
The ASML Twinscan AT 1100 is a 193 nm ArF laser-based lithography scanner that processes 200 mm and 300 mm wafers using dual-wafer stage technology.
The ASML Twinscan AT 400 S is an i-line scanner stated to be a 365 nm system from 2001.
The ASML Twinscan AT 750 B is a semiconductor tool identified with a Cymer ELS 6600 laser and a Tel Lithius Track configuration.
The ASML Twinscan NXT 1980 i is a 12-inch wafer lithography scanner that was upgraded from the 1970i model.
ASML Twinscan XT 1950 Hi is a scanner for 12-inch wafers used for 193 nm immersion lithography with 38 nm resolution capacity.