Waferpedia

Tool family

ASML TWINSCAN EXE:5000

ASMLLithography1 entry

The ASML TWINSCAN EXE:5000 is a dual-stage extreme ultraviolet (EUV) lithography system that uses a 13.5 nm light source and a numerical aperture of 0.55 to achieve 8 nm resolution.

LinkedIn X Email

Models in this family

  1. TWINSCAN EXE:5000introduced 2023High NA

    The ASML TWINSCAN EXE:5000 is a dual-stage extreme ultraviolet (EUV) lithography system that uses a 13.5 nm light source and a numerical aperture of 0.55 to achieve 8 nm resolution.

    Cited variants

    DesignationGenerationVintageChangesSource
    TWINSCAN EXE:5200BHigh NA—Designed to support volume production of sub-2 nm Logic nodes and leading-edge DRAM nodes.asml.com[1]

Sources

Sources (1)Every fact above is drawn from these public sources
  1. [1]asml.comasml.com