Waferpedia

Tool family

CEE 100

CEEDeposition4 entries

Models in this family

  1. The CEE 100 is a lithography spin coater/developer tool that accepts up to 6-inch wafers and supports programmable multi-step processing.

    Cited variants

    DesignationGenerationVintageChangesSource
    CEE 100CB——Includes a hotplate; available in table top and bench mount configurationsnanofab.ece.cmu.edu[1]
  2. The CEE 100 CB Spin is a spin coater from the CEE 100 family.

    Cited variants

    DesignationGenerationVintageChangesSource
    CEE 100 CB Spin Coater Hot Plate——Includes a hot plate and a flow controllerwaferpedia.com[2]
  3. The CEE 100 CB is a spin coater/hot plate with a flow controller.

  4. The CEE 100 is a spin coater with a listed power specification of 115 volts and 800 watts.

All entries

  1. 100CEE

    The CEE 100 is a lithography spin coater/developer tool that accepts up to 6-inch wafers and supports programmable multi-step processing.

    CategoryLithographyWafer6"
    9 specs
  2. 100 CB SpinCEE

    The CEE 100 CB Spin is a spin coater from the CEE 100 family.

    CategoryDeposition
    2 specs
  3. 100 CB Spin Coater Hot PlateCEE

    The CEE 100 CB is a spin coater/hot plate with a flow controller.

    1 spec
  4. 100 SpinCEE

    The CEE 100 is a spin coater with a listed power specification of 115 volts and 800 watts.

    CategoryResist Processing
    2 specs

Sources

Sources (2)Every fact above is drawn from these public sources
  1. [1]nanofab.ece.cmu.edunanofab.ece.cmu.edu
  2. [2]waferpedia.comwaferpedia.com